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9 relations: Ammonia, Chemical vapor deposition, Dichloromethane, Disproportionation, Hydrogen chloride, Silane, Silicon tetrachloride, Stress (mechanics), Trichlorosilane.
Ammonia
Ammonia is a compound of nitrogen and hydrogen with the formula NH3.
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Chemical vapor deposition
Chemical vapor deposition (CVD) is deposition method used to produce high quality, high-performance, solid materials, typically under vacuum.
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Dichloromethane
Methylene dichloride (DCM, or methylene chloride, or dichloromethane) is a geminal organic compound with the formula CH2Cl2.
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Disproportionation
Disproportionation, sometimes called dismutation, is a redox reaction in which a compound of intermediate oxidation state converts to two different compounds, one of higher and one of lower oxidation states.
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Hydrogen chloride
The compound hydrogen chloride has the chemical formula and as such is a hydrogen halide.
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Silane
Silane is an inorganic compound with chemical formula, SiH4, making it a group 14 hydride.
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Silicon tetrachloride
Silicon tetrachloride or tetrachlorosilane is the inorganic compound with the formula SiCl4.
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Stress (mechanics)
In continuum mechanics, stress is a physical quantity that expresses the internal forces that neighboring particles of a continuous material exert on each other, while strain is the measure of the deformation of the material.
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Trichlorosilane
Trichlorosilane is an inorganic compound with the formula HSiCl3.
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Cl2H2Si, Dichlorsilane, SiH2Cl2.
