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18 relations: Anisotropy, Ångström, Bis(trimethylsilyl)amine, Czochralski process, Diamond cubic, Erg, Goniometer, Hydrophobe, Lithography, Microelectromechanical systems, Microfabrication, Miller index, Photolithography, Photomask, Photoresist, Spin coating, Thin film, Wafer (electronics).
Anisotropy
Anisotropy, is the property of being directionally dependent, which implies different properties in different directions, as opposed to isotropy.
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Ångström
The ångström or angstrom is a unit of length equal to (one ten-billionth of a metre) or 0.1 nanometre.
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Bis(trimethylsilyl)amine
Bis(trimethylsilyl)amine (also known as hexamethyldisilazane, or HMDS) is an organosilicon compound with the molecular formula 2NH.
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Czochralski process
The Czochralski process is a method of crystal growth used to obtain single crystals of semiconductors (e.g. silicon, germanium and gallium arsenide), metals (e.g. palladium, platinum, silver, gold), salts and synthetic gemstones.
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Diamond cubic
The diamond cubic crystal structure is a repeating pattern of 8 atoms that certain materials may adopt as they solidify.
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Erg
The erg is a unit of energy and work equal to 10−7 joules.
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Goniometer
A goniometer is an instrument that either measures an angle or allows an object to be rotated to a precise angular position.
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Hydrophobe
In chemistry, hydrophobicity is the physical property of a molecule (known as a hydrophobe) that is seemingly repelled from a mass of water.
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Lithography
Lithography is a method of printing originally based on the immiscibility of oil and water.
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Microelectromechanical systems
Microelectromechanical systems (MEMS, also written as micro-electro-mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems and the related micromechatronics) is the technology of microscopic devices, particularly those with moving parts.
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Microfabrication
Microfabrication is the process of fabricating miniature structures of micrometre scales and smaller.
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Miller index
Miller indices form a notation system in crystallography for planes in crystal (Bravais) lattices.
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Photolithography
Photolithography, also termed optical lithography or UV lithography, is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate.
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Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern.
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Photoresist
A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface.
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Spin coating
Spin coating is a procedure used to deposit uniform thin films to flat substrates.
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Thin film
A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness.
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Wafer (electronics)
A wafer, also called a slice or substrate, is a thin slice of semiconductor material, such as a crystalline silicon, used in electronics for the fabrication of integrated circuits and in photovoltaics for conventional, wafer-based solar cells.
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References
[1] https://en.wikipedia.org/wiki/Chemistry_of_photolithography
