Faster access than browser!Similarities between 32 nanometer and Photolithography
32 nanometer and Photolithography have 7 things in common (in Unionpedia): CMOS, Electron-beam lithography, Immersion lithography, Multiple patterning, Nanometre, Numerical aperture, Semiconductor device fabrication.
CMOS
Complementary metal–oxide–semiconductor, abbreviated as CMOS, is a technology for constructing integrated circuits.
32 nanometer and CMOS · CMOS and Photolithography ·
Electron-beam lithography
Electron-beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing).
32 nanometer and Electron-beam lithography · Electron-beam lithography and Photolithography ·
Immersion lithography
Immersion lithography is a photolithography resolution enhancement technique for manufacturing integrated circuits (ICs) that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one.
32 nanometer and Immersion lithography · Immersion lithography and Photolithography ·
Multiple patterning
Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density.
32 nanometer and Multiple patterning · Multiple patterning and Photolithography ·
Nanometre
The nanometre (International spelling as used by the International Bureau of Weights and Measures; SI symbol: nm) or nanometer (American spelling) is a unit of length in the metric system, equal to one billionth (short scale) of a metre (m).
32 nanometer and Nanometre · Nanometre and Photolithography ·
Numerical aperture
In optics, the numerical aperture (NA) of an optical system is a dimensionless number that characterizes the range of angles over which the system can accept or emit light.
32 nanometer and Numerical aperture · Numerical aperture and Photolithography ·
Semiconductor device fabrication
Semiconductor device fabrication is the process used to create the integrated circuits that are present in everyday electrical and electronic devices.
32 nanometer and Semiconductor device fabrication · Photolithography and Semiconductor device fabrication ·
The list above answers the following questions
- What 32 nanometer and Photolithography have in common
- What are the similarities between 32 nanometer and Photolithography
32 nanometer and Photolithography Comparison
32 nanometer has 28 relations, while Photolithography has 93. As they have in common 7, the Jaccard index is 5.79% = 7 / (28 + 93).
References
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