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CMOS and High-κ dielectric

Shortcuts: Differences, Similarities, Jaccard Similarity Coefficient, References.

Difference between CMOS and High-κ dielectric

CMOS vs. High-κ dielectric

Complementary metal–oxide–semiconductor, abbreviated as CMOS, is a technology for constructing integrated circuits. The term high-κ dielectric refers to a material with a high dielectric constant κ (as compared to silicon dioxide).

Similarities between CMOS and High-κ dielectric

CMOS and High-κ dielectric have 7 things in common (in Unionpedia): MOSFET, Quantum tunnelling, Silicon, Silicon dioxide, Subthreshold conduction, Threshold voltage, 45 nanometer.

MOSFET

MOSFET showing gate (G), body (B), source (S) and drain (D) terminals. The gate is separated from the body by an insulating layer (white). surface-mount packages. Operating as switches, each of these components can sustain a blocking voltage of 120nbspvolts in the ''off'' state, and can conduct a continuous current of 30 amperes in the ''on'' state, dissipating up to about 100 watts and controlling a load of over 2000 watts. A matchstick is pictured for scale. A cross-section through an nMOSFET when the gate voltage ''V''GS is below the threshold for making a conductive channel; there is little or no conduction between the terminals drain and source; the switch is off. When the gate is more positive, it attracts electrons, inducing an ''n''-type conductive channel in the substrate below the oxide, which allows electrons to flow between the ''n''-doped terminals; the switch is on. Simulation result for formation of inversion channel (electron density) and attainment of threshold voltage (IV) in a nanowire MOSFET. Note that the threshold voltage for this device lies around 0.45 V The metal-oxide-semiconductor field-effect transistor (MOSFET, MOS-FET, or MOS FET) is a type of field-effect transistor (FET), most commonly fabricated by the controlled oxidation of silicon.

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Quantum tunnelling

Quantum tunnelling or tunneling (see spelling differences) is the quantum mechanical phenomenon where a particle tunnels through a barrier that it classically cannot surmount.

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Silicon

Silicon is a chemical element with symbol Si and atomic number 14.

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Silicon dioxide

Silicon dioxide, also known as silica (from the Latin silex), is an oxide of silicon with the chemical formula, most commonly found in nature as quartz and in various living organisms.

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Subthreshold conduction

Subthreshold conduction or subthreshold leakage or subthreshold drain current is the current between the source and drain of a MOSFET when the transistor is in subthreshold region, or weak-inversion region, that is, for gate-to-source voltages below the threshold voltage.

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Threshold voltage

The threshold voltage, commonly abbreviated as Vth, of a field-effect transistor (FET) is the minimum gate-to-source voltage VGS (th) that is needed to create a conducting path between the source and drain terminals.

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45 nanometer

Per the International Technology Roadmap for Semiconductors, the 45 nanometer (45 nm) technology node should refer to the average half-pitch of a memory cell manufactured at around the 2007–2008 time frame.

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The list above answers the following questions

CMOS and High-κ dielectric Comparison

CMOS has 76 relations, while High-κ dielectric has 39. As they have in common 7, the Jaccard index is 6.09% = 7 / (76 + 39).

References

This article shows the relationship between CMOS and High-κ dielectric. To access each article from which the information was extracted, please visit:

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