Faster access than browser!Similarities between Dip-pen nanolithography and Photolithography
Dip-pen nanolithography and Photolithography have 4 things in common (in Unionpedia): Electron-beam lithography, Maskless lithography, Photomask, Soft lithography.
Electron-beam lithography
Electron-beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing).
Dip-pen nanolithography and Electron-beam lithography · Electron-beam lithography and Photolithography ·
Maskless lithography
In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.
Dip-pen nanolithography and Maskless lithography · Maskless lithography and Photolithography ·
Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern.
Dip-pen nanolithography and Photomask · Photolithography and Photomask ·
Soft lithography
In technology, soft lithography is a family of techniques for fabricating or replicating structures using "elastomeric stamps, molds, and conformable photomasks".
Dip-pen nanolithography and Soft lithography · Photolithography and Soft lithography ·
The list above answers the following questions
- What Dip-pen nanolithography and Photolithography have in common
- What are the similarities between Dip-pen nanolithography and Photolithography
Dip-pen nanolithography and Photolithography Comparison
Dip-pen nanolithography has 26 relations, while Photolithography has 93. As they have in common 4, the Jaccard index is 3.36% = 4 / (26 + 93).
References
This article shows the relationship between Dip-pen nanolithography and Photolithography. To access each article from which the information was extracted, please visit:
