Faster access than browser!Similarities between Lithography and Photolithography
Lithography and Photolithography have 14 things in common (in Unionpedia): Electron-beam lithography, Etching, Extreme ultraviolet lithography, Integrated circuit, Lithography, Magnetolithography, Maskless lithography, Microelectromechanical systems, Nanoimprint lithography, Nanometre, Photomask, Resist, Stereolithography, X-ray lithography.
Electron-beam lithography
Electron-beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing).
Electron-beam lithography and Lithography · Electron-beam lithography and Photolithography ·
Etching
Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio (incised) in the metal.
Etching and Lithography · Etching and Photolithography ·
Extreme ultraviolet lithography
Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Extreme ultraviolet lithography and Lithography · Extreme ultraviolet lithography and Photolithography ·
Integrated circuit
An integrated circuit or monolithic integrated circuit (also referred to as an IC, a chip, or a microchip) is a set of electronic circuits on one small flat piece (or "chip") of semiconductor material, normally silicon.
Integrated circuit and Lithography · Integrated circuit and Photolithography ·
Lithography
Lithography is a method of printing originally based on the immiscibility of oil and water.
Lithography and Lithography · Lithography and Photolithography ·
Magnetolithography
Magnetolithography (ML) is a method for pattern surfaces.
Lithography and Magnetolithography · Magnetolithography and Photolithography ·
Maskless lithography
In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.
Lithography and Maskless lithography · Maskless lithography and Photolithography ·
Microelectromechanical systems
Microelectromechanical systems (MEMS, also written as micro-electro-mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems and the related micromechatronics) is the technology of microscopic devices, particularly those with moving parts.
Lithography and Microelectromechanical systems · Microelectromechanical systems and Photolithography ·
Nanoimprint lithography
Nanoimprint lithography is a method of fabricating nanometer scale patterns.
Lithography and Nanoimprint lithography · Nanoimprint lithography and Photolithography ·
Nanometre
The nanometre (International spelling as used by the International Bureau of Weights and Measures; SI symbol: nm) or nanometer (American spelling) is a unit of length in the metric system, equal to one billionth (short scale) of a metre (m).
Lithography and Nanometre · Nanometre and Photolithography ·
Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern.
Lithography and Photomask · Photolithography and Photomask ·
Resist
A resist, used in many areas of manufacturing and art, is something that is added to parts of an object to create a pattern by protecting these parts from being affected by a subsequent stage in the process.
Lithography and Resist · Photolithography and Resist ·
Stereolithography
Stereolithography (SLA or SL; also known as stereolithography apparatus, optical fabrication, photo-solidification, or resin printing) is a form of 3D printing technology used for creating models, prototypes, patterns, and production of parts in a layer by layer fashion using photopolymerization, a process by which light causes chains of molecules to link, forming polymers.
Lithography and Stereolithography · Photolithography and Stereolithography ·
X-ray lithography
X-ray lithography, is a process used in electronic industry to selectively remove parts of a thin film.
Lithography and X-ray lithography · Photolithography and X-ray lithography ·
The list above answers the following questions
- What Lithography and Photolithography have in common
- What are the similarities between Lithography and Photolithography
Lithography and Photolithography Comparison
Lithography has 130 relations, while Photolithography has 93. As they have in common 14, the Jaccard index is 6.28% = 14 / (130 + 93).
References
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