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Ion beam deposition

Index Ion beam deposition

Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1]

14 relations: Carbon, Cathodic arc deposition, Electron beam-induced deposition, Electron ionization, Electronvolt, Electrospray ionization, Ion beam, Ion beam-assisted deposition, Ion implantation, Ion source, Mass spectrometry, Matrix-assisted laser desorption/ionization, Sputter deposition, Stoichiometry.

Carbon

Carbon (from carbo "coal") is a chemical element with symbol C and atomic number 6.

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Cathodic arc deposition

Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target.

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Electron beam-induced deposition

Electron beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate.

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Electron ionization

Electron ionization (EI, formerly known as electron impact ionization and electron bombardment ionization) is an ionization method in which energetic electrons interact with solid or gas phase atoms or molecules to produce ions.

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Electronvolt

In physics, the electronvolt (symbol eV, also written electron-volt and electron volt) is a unit of energy equal to approximately joules (symbol J).

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Electrospray ionization

Electrospray ionization (ESI) is a technique used in mass spectrometry to produce ions using an electrospray in which a high voltage is applied to a liquid to create an aerosol.

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Ion beam

An ion beam is a type of charged particle beam consisting of ions.

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Ion beam-assisted deposition

Ion beam assisted deposition or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique.

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Ion implantation

Ion implantation is low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the target.

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Ion source

An ion source is a device that creates atomic and molecular ions.

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Mass spectrometry

Mass spectrometry (MS) is an analytical technique that ionizes chemical species and sorts the ions based on their mass-to-charge ratio.

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Matrix-assisted laser desorption/ionization

In mass spectrometry, matrix-assisted laser desorption/ionization (MALDI) is an ionization technique that uses a laser energy absorbing matrix to create ions from large molecules with minimal fragmentation.

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Sputter deposition

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering.

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Stoichiometry

Stoichiometry is the calculation of reactants and products in chemical reactions.

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References

[1] https://en.wikipedia.org/wiki/Ion_beam_deposition

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